Atomic Scale Segment Specialist at Oxford Instruments and Part-time Assistant Professor at Eindhoven University of Technology
Eindhoven, The Netherlands
Joined June 2011
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Proud of Silke Peeters for the first paper in our project @TUeindhoven. Plasma #ALDep of high-quality TaCxNx-1 using substrate bias, these ultrathin superconducting films are promising for a range of #quantum devices.@OxInst @QuantumSensors @ErwinKessels doi.org/10.1063/5.0169339
At @euroCVD #BalticALD, Silke Peeters @TUeindhoven discusses how substrate biasing can help plasma #ALDep of tantalum carbonitride for quantum devices
Harm Knoops retweeted
ICYMI: Plasma Enhanced Atomic Layer Etching of High-k Layers on WS2 #JVSTA @AVS_Members avs.scitation.org/doi/10.111…
A teaser by Ageeth Bol for #PapersMattinen his talk on low temperature plasma #ALDep of MoS2 on Wednesday at #ALDALE2022 @TUeindhoven @OxInst
Harm Knoops retweeted
What´s the difference between ~99.3 % and ~99.8 % absorption? Check our Paper on #ALDep of #blackcoating invented @Leibniz_IPHT using @OxInst Tools. Or let´s talks @AvsAld in June.
pubs.acs.org/doi/abs/10.1021…
Collaborative study on Atomfab production tool: @OxInst showed fast and uniform remote plasma #ALDep, @TUeindhoven measured plasma showing low damage conditions, @UofGEngineering showed suitability for #GaNpower electronics & RF devices doi.org/10.1116/6.0001318
Harm Knoops retweeted
Challenge-based learning: This is how we have students unravelling complex nanoelectronic devices in our course about Plasma Processing including #ALDep and #ALEtch - Part 1 atomiclimits.com/2021/09/22/…
Bárbara Canto shows in #AMOGmbH, @OxInst collaboration that monolayer hBN can protect #Graphene, when low-damage #PlasmaTech #ALDep Al2O3 is used. Shows that Atomfab is destined for more things than GaN power device passivation 😎 @sundaramravi @max_lemme doi.org/10.1002/admt.2021004…
Harm Knoops retweeted
Please check out these beautiful transmission electron microscopy (#TEM) images if you are interested in the conformality and gap-fill by plasma-assisted Atomic Layer Deposition (#ALDep). It made it to the cover of @ChemMater lnkd.in/e5kyKMz
Harm Knoops retweeted
Just out! Don't miss our latest issue, now available online: acsjournals.co/siBW50FuSRx
Happy to see that the isotropic ALE process Nick Chittock developed last year was now also transferred to the @Oxinst FlexAL. Furthermore, combined with ALD it can smooth surfaces more than initially expected (and Nick even understands why). #ALDALE2021 @TUeindhoven @ErwinKessels
Nice example by Moustapha Jaffal at #ALDALE2021 of using plasma #ALDep, quasi ALE and even sputtering using Ar plasma with substrate bias in a single tool, an
@Oxinst #PlasmaTech #FlexAL @MINATEC @CEA_Leti @UGrenobleAlpes
Please check out #ALDALE2021 on-demand talks. Not only from my @OxInst colleague Yi Shu on strategies for nitride and oxide stacks by #ALDep, but for instance also for two talks by @DCUPhysics who investigate TiO2 and cobalt nitride #ALDep on their new #FlexAL clustered with XPS.
Experiments and DFT from Adriana Creatore’s group show how biasing in plasma #ALDep can lower O content. Oxygen can be removed from the surface by hydrogen if the ion energy is sufficient. Experiments done on @OxInst #FlexAL @TUeindhoven @ErwinKessels doi.org/10.1039/D0NR08921D
Nice work from @freakywindow @cardiffuni with #ALDep done @TUeindhoven doi.org/10.1016/j.carbon.202… The challenge is that diamond growth on Ga2O3 for thermal management needs a seed/barrier. We found that Al2O3 doesn’t work but #Plasma #ALDep SiO2 does. #FlexAL @OxInst @ErwinKessels
Harm Knoops retweeted
This week continuing counting down the top 10 most influential plasma-related articles published in @JVSTAB during the last two years @AVS_Members @AvsPlasma
And finally at #1 from @HarmKnoops @ErwinKessels @OxInst @TUeindhoven
avs.scitation.org/doi/10.111…